| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray sensitive or radiation sensitive resin composition that not only can simultaneously satisfy high sensitivity, high resolution, favorable pattern shape, favorable line edge roughness and favorable exposure latitude (EL) at high levels but also can achieve satisfactorily favorable outgassing performance during exposure.SOLUTION: The actinic ray sensitive or radiation sensitive resin composition includes a resin (P) comprising any of repeating units (A) of general formula (I) below, each of which contains an ionic structural moiety that when irradiated with actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin, where Arrepresents a bivalent aromatic ring group and Xrepresents a single bond, -O-, -S-, -C(=O)-, -S(=O)-, -S(=O)- or a methylene group which may have a substituent. |
