发明名称 Thin Film Transistor Substrate And Manufacturing Method Thereof
摘要 A thin film transistor and a manufacturing method thereof are provided to prevent a heat accumulation phenomenon by forming a plurality of channel units separately. A plurality of sub thin film transistors include ring type channel units respectively. A plurality of channel units(115) of sub thin film transistors are formed to be separated. The sub thin transistor includes a source electrode(108), a drain electrode, a semiconductor layer, and a gate electrode(106). The source electrode has a ring shape to surround the channel unit. The drain electrode is formed to face an inner surface of the source electrode while interposing a channel. The semiconductor forms the channel between the source and drain electrodes. The gate electrode is overlapped with the semiconductor layer.
申请公布号 KR101362161(B1) 申请公布日期 2014.02.13
申请号 KR20070073927 申请日期 2007.07.24
申请人 发明人
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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