| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION FOR PERMANENT MASK RESIST, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD |
| 摘要 |
<p>The present invention provides a photosensitive resin composition for a permanent mask resist, the resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator and (C) a nitroxyl compound. The nitroxyl compound (C) contains a compound having a specific structure.</p> |
| 申请公布号 |
WO2014024804(A1) |
申请公布日期 |
2014.02.13 |
| 申请号 |
WO2013JP71060 |
申请日期 |
2013.08.02 |
| 申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
YORI HANAKO;OOTA EMIKO;MURAKAMI YASUHARU;NAGOSHI TOSHIMASA;TANAKA SHIGEO |
| 分类号 |
G03F7/004;G03F7/027;H05K3/28 |
主分类号 |
G03F7/004 |
| 代理机构 |
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