| 摘要 |
PURPOSE: A trap device for manufacturing a semiconductor improves efficiency by selecting only metallic materials from discharged gas. CONSTITUTION: A trap unit (20) is arranged between a processing chamber and a vacuum pump and catches a by-product of gas (G). The trap unit includes a discharge line (23) discharging caught metallic materials (M). A magnetic unit (30) surrounds the outer surface of the trap unit. The magnetic unit selects and catches the metallic materials among the by-product of the gas by magnetic force. The magnetic unit includes a first magnetic body (31) surrounding the outer surface of the trap unit and a second magnetic body (32) surrounding the outer surface of the first magnetic body. |
