发明名称 Hexagonal wurtzite type epitaxial layer possessing a low alkali-metal concentration and method of creating the same
摘要 A method of obtaining a hexagonal würtzite type epitaxial layer with a low impurity concentration of alkali-metal by using a hexagonal würtzite substrate possessing a higher impurity concentration of alkali-metal, wherein a surface of the substrate upon which the epitaxial layer is grown has a crystal plane which is different from the c-plane.
申请公布号 US8647967(B2) 申请公布日期 2014.02.11
申请号 US20090474143 申请日期 2009.05.28
申请人 SAITO MAKOTO;KAWABATA SHIN-ICHIRO;KAMBER DERRICK S.;DENBAARS STEVEN P.;SPECK JAMES S.;NAKAMURA SHUJI;THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 SAITO MAKOTO;KAWABATA SHIN-ICHIRO;KAMBER DERRICK S.;DENBAARS STEVEN P.;SPECK JAMES S.;NAKAMURA SHUJI
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址