TEMPERATURE CONTROL DEVICE, COATING-DEVELOPING APPARATUS, TEMPERATURE CONTROL METHOD AND STORAGE MEDIUM

摘要

A heating device has a heating chamber 3. An initial temperature distribution is created in a surface of a substrate (wafer W) when the substrate is carried into the heating chamber 3 . . . Temperature distribution creating means (heating lamps 2) creates a preheating temperature distribution in the substrate supported on a cooling plate 4 at a waiting position before the substrate is carried into the heating chamber 3 so as to level out the initial temperature distribution.