| 摘要 |
Disclosed is a cleaning agent for a silicon wafer, which contains at least an aqueous cleaning liquid and a water repellent cleaning liquid for providing at least recessed portions in a pattern of projections and recesses with water repellency during a cleaning process. The water repellent cleaning liquid contains a mixture of a water repellent compound, which contains a hydrophobic group and a reactive moiety that can be chemically bonded with Si of a silicon wafer, and an organic solvent that contains at least an alcohol solvent. By using the cleaning agent, the cleaning process, in which a pattern collapse is easily induced, can be improved. |
