CHARGED PARTICLE BEAM DEVICE

摘要

The present invention is a defect inspection device that makes use of the fact that the contrast of grains and voids in a copper wire of a semiconductor in a scanning electron microscope varies depending on the acceleration voltage for electron beam irradiation. This charged particle beam device irradiates an electron beam at a plurality of acceleration voltages onto the same location of a specimen, and differentiates grains (65, 66) and voids (67) on the basis of the amount of change in contrast the same location in a plurality of images (61, 62) taken in correlation to the plurality of acceleration voltages, respectively. Grains and voids can thereby be automatically differentiated and detected at high speed without destruction of the specimen.