发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>Provided is a photosensitive resin composition comprising 5%-45% of an alkali soluble resin, 0.5%-18% of a photosensitive monomer containing vinyl unsaturated double bonds, 4%-15% of a pigment, 0.1-3% of a photoinitiator, 40%-64.4% of a solvent, 0.1%-7% of a polymeric silane coupling agent, and 0.1%-1% of an aid. As a colour photoresist, the photosensitive resin composition can be used for obtaining a smooth edge and a relatively small slope angle after development.</p>
申请公布号 WO2014019320(A1) 申请公布日期 2014.02.06
申请号 WO2012CN87201 申请日期 2012.12.21
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 SHU, SHI;HUI, GUANBAO;XUE, JIANSHE;LIU, LU
分类号 G03F7/004;G03F7/027 主分类号 G03F7/004
代理机构 代理人
主权项
地址