| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming device with excellent controllability of a plasma generation position for exciting plasma in a processing container by supplying microwaves.SOLUTION: A film forming device 10 comprises: a mounting table 14; a processing container 12; a gas supply section 16; and a plasma generation section 22. The mounting table 14 is provided rotatably around an axial line Z as a center, so that plural substrate mounting regions 14a move in a circumferential direction. A processing chamber C houses the mounting table 14, and includes a first region and a second region R2. The substrate mounting region 14a moving in the circumferential direction to the axial line Z by rotation of the mounting table 14 sequentially passes through the first region and the second region R2. The plasma generation section 22 includes: one or more waveguide pipes 70 for defining a waveguide WG above the second region R2; a microwave generator 48 connected to the waveguide pipes; and plural dielectric projecting sections 72 extending to the second region R2 through plural openings provided at lower conductor sections of one or more waveguide pipes 70. |
