| 发明名称 |
SALT, RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN |
| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern with excellent pattern collapse resistance can be produced.SOLUTION: A resist pattern with excellent pattern collapse resistance can be produced by using a resist composition containing a salt expressed by formula (I) as an acid generator. |
| 申请公布号 |
JP2014019690(A) |
申请公布日期 |
2014.02.03 |
| 申请号 |
JP20120163145 |
申请日期 |
2012.07.23 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;KAMABUCHI AKIRA;FUJITA SHINGO |
| 分类号 |
C07D333/16;C07C309/17;C07D333/24;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C07D333/16 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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