| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin for a resist showing a small line width variation to fluctuations in exposure luminous energy.SOLUTION: The resin includes an ester of an alcohol having a keto group and oxygen-containing heterocycle with an unsaturated carboxylic acid, a structural unit expressed by formula (II), and a structural unit having an acid-labile group. In formula (II), Rrepresents an alkyl group having 1 to 6 carbon atoms, optionally having a halogen atom, or a hydrogen atom or a halogen atom; Zrepresents a divalent aliphatic saturated hydrocarbon group having 1 to 17 carbon atoms, or the like; Rrepresents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and ring Trepresents a sultone ring optionally having a substituent. |
