发明名称 Electrostatic discharge (ESD) silicon controlled rectifier (SCR) structure
摘要 A structure includes first and second silicon controlled rectifiers (SCRs) formed in a substrate. The first and the second SCRs each include at least one component commonly shared between the first and the second SCRs.
申请公布号 US8637900(B2) 申请公布日期 2014.01.28
申请号 US201213686422 申请日期 2012.11.27
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 GAUTHIER, JR. ROBERT J.;LI JUNJUN;SRIVASTAVA ANKIT
分类号 H01L29/66 主分类号 H01L29/66
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