发明名称 PASSIVATION FILM, COATING MATERIAL, SOLAR-CELL ELEMENT, AND SILICON SUBSTRATE WITH PASSIVATION FILM ATTACHED THERETO
摘要 <p>A passivation film for use in a solar-cell element having a silicon substrate is configured so as to contain an aluminum oxide and a niobium oxide. In addition, a solar-cell element is equipped with: a p-type silicon substrate (1) comprising monocrystalline silicon or polycrystalline silicon; an n-type impurity diffusion layer (2) formed on the light-receiving-surface side of the silicon substrate (1); a first electrode (5) formed on the surface of the diffusion layer (2); a second electrode (6) formed on the rear-surface side of the silicon substrate (1); and a passivation film (7) containing an aluminum oxide and a niobium oxide, having a plurality of open areas (OA), and formed on the rear-surface-side surface of the silicon substrate (1). Therein, the second electrode (6) is configured so as to form an electrical connection with the rear-surface-side surface of the silicon substrate (1) via the plurality of open areas (OA).</p>
申请公布号 WO2014014117(A1) 申请公布日期 2014.01.23
申请号 WO2013JP69707 申请日期 2013.07.19
申请人 HITACHI CHEMICAL COMPANY, LTD. 发明人 HATTORI, TAKASHI;MATSUMURA, MIEKO;WATANABE, KEIJI;MORISHITA, MASATOSHI;HAMAMURA, HIROTAKA
分类号 H01L31/04;H01L21/316 主分类号 H01L31/04
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