发明名称 LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSING METHOD, METHOD FOR MANUFACTURING DEVICE, PROGRAM, AND RECORDING MEDIUM
摘要 A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate via liquid by exposure light, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light, that includes a second upper surface which is opposite to the first lower surface of the first member via a gap, a second lower surface which is capable of being opposite to the object, and a fluid recovery part which is disposed at at least a portion of surrounding of the second lower surface, and that is relatively movable with respect to the first member.
申请公布号 US2014022522(A1) 申请公布日期 2014.01.23
申请号 US201313940685 申请日期 2013.07.12
申请人 NIKON CORPORATION 发明人 SATO SHINJI
分类号 G03F7/20 主分类号 G03F7/20
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