发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTORESIST FILM USING SAME, RESIST PATTERN FORMING METHOD, AND CONDUCTOR PATTERN FORMING METHOD
摘要 <p>The present invention relates to a photosensitive resin composition comprising a binder polymer, a photopolymerizable monomer containing an amine group, a photopolymerization initiator, and a benzotriazole derivative containing a carboxyl group. The present invention also relates to a photoresist film containing a photosensitive resin composition layer comprising the photosensitive resin composition and a support layer. The photosensitive resin composition and photoresist film provide excellent resolution and adhesion, an extremely small fringe on the cured resist after development, and excellent release properties.</p>
申请公布号 KR20140010131(A) 申请公布日期 2014.01.23
申请号 KR20137026142 申请日期 2012.02.27
申请人 NICHIGO-MORTON CO., LTD. 发明人 TOYOTA HIROKI
分类号 G03F7/027;C08F2/50;C08F265/00;G03F7/004;G03F7/085;H05K3/06;H05K3/18 主分类号 G03F7/027
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