发明名称 Phase change memory device, storage system having the same and fabricating method thereof
摘要 Provided are a phase change memory device and a fabricating method thereof. The phase change memory device includes a substrate, an interlayer dielectric layer formed on the substrate, first and second contact holes formed in the interlayer dielectric layer, and a memory cell formed in the first and second contact holes and including a diode, a first electrode on the diode, a phase change material layer on the first electrode, and a second electrode on the phase change material layer, wherein the first contact hole and the second contact hole are spaced apart from and separated from each other.
申请公布号 US8634236(B2) 申请公布日期 2014.01.21
申请号 US201113234924 申请日期 2011.09.16
申请人 PARK HYE-YOUNG;PARK JEONG-HEE;KWON HYUN-SUK;SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK HYE-YOUNG;PARK JEONG-HEE;KWON HYUN-SUK
分类号 G11C11/00;G11C5/02;H01L21/00;H01L21/06;H01L29/06 主分类号 G11C11/00
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