发明名称 Semiconductor device
摘要 A semiconductor device may include, but is not limited to: a semiconductor substrate; a first insulating film; a conductive film; and a semiconductor film. The semiconductor substrate has a first hole. The semiconductor substrate has a first region into which a first impurity is introduced. The first region is adjacent to a side surface of the first hole. The first insulating film covers at least the side surface and a bottom surface of the first hole. The first insulating film has a second hole adjacent to the side surface of the first hole. The conductive film fills a bottom portion of the first hole. The semiconductor film is positioned over the conductive film. The semiconductor film fills the second hole and is in contact with the first region.
申请公布号 US8633531(B2) 申请公布日期 2014.01.21
申请号 US20100889437 申请日期 2010.09.24
申请人 MIKASA NORIAKI 发明人 MIKASA NORIAKI
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址