发明名称 Methods of forming a memory cell having programmable material that comprises a multivalent metal oxide portion and an oxygen containing dielectric portion
摘要 A method of forming a memory cell includes forming one of multivalent metal oxide material or oxygen-containing dielectric material over a first conductive structure. An outer surface of the multivalent metal oxide material or the oxygen-containing dielectric material is treated with an organic base. The other of the multivalent metal oxide material or oxygen-containing dielectric material is formed over the treated outer surface. A second conductive structure is formed over the other of the multivalent metal oxide material or oxygen-containing dielectric material.
申请公布号 US8633084(B1) 申请公布日期 2014.01.21
申请号 US201213654258 申请日期 2012.10.17
申请人 MICRON TECHNOLOGY, INC. 发明人 RAMASWAMY D. V. NIRMAL;COOK BETH R.;BI LEI;HUANG WAYNE;LABORIANTE IAN C.
分类号 H01L21/20 主分类号 H01L21/20
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