发明名称 SEMICONDUCTOR DEVICE HAVING DRAIN AND ISOLATION STRUCTURE INTERCONNECTED VIA DIODE CIRCUIT, AND DRIVER CIRCUIT AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device having a drain and an isolation structure interconnected via a diode circuit, and to provide a driver circuit and a manufacturing method therefor.SOLUTION: The semiconductor device includes: a semiconductor substrate 210; a buried layer 220 under a substrate upper surface 212; a sinker region 222 between the substrate upper surface and the buried layer, forming an isolation structure in conjunction with the buried layer; and an active device located in a part of the semiconductor substrate received by the isolation structure, and including a drain region 236.
申请公布号 JP2014011454(A) 申请公布日期 2014.01.20
申请号 JP20130127558 申请日期 2013.06.18
申请人 FREESCALE SEMICONDUCTOR INC 发明人 WEIZE CHEIN;HUBERT M BODE;RICHARD J DE SOUZA;PATRICE M PARRIS
分类号 H01L21/8234;H01L21/822;H01L27/04;H01L27/06 主分类号 H01L21/8234
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