发明名称 |
SEMICONDUCTOR DEVICE HAVING DRAIN AND ISOLATION STRUCTURE INTERCONNECTED VIA DIODE CIRCUIT, AND DRIVER CIRCUIT AND MANUFACTURING METHOD THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device having a drain and an isolation structure interconnected via a diode circuit, and to provide a driver circuit and a manufacturing method therefor.SOLUTION: The semiconductor device includes: a semiconductor substrate 210; a buried layer 220 under a substrate upper surface 212; a sinker region 222 between the substrate upper surface and the buried layer, forming an isolation structure in conjunction with the buried layer; and an active device located in a part of the semiconductor substrate received by the isolation structure, and including a drain region 236. |
申请公布号 |
JP2014011454(A) |
申请公布日期 |
2014.01.20 |
申请号 |
JP20130127558 |
申请日期 |
2013.06.18 |
申请人 |
FREESCALE SEMICONDUCTOR INC |
发明人 |
WEIZE CHEIN;HUBERT M BODE;RICHARD J DE SOUZA;PATRICE M PARRIS |
分类号 |
H01L21/8234;H01L21/822;H01L27/04;H01L27/06 |
主分类号 |
H01L21/8234 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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