| 摘要 |
PROBLEM TO BE SOLVED: To inhibit the damage of substrates.SOLUTION: A CVD device (a substrate processing apparatus) 40 includes: a processing chamber 41 for housing a glass substrate (a substrate) GS and performing processing on the glass substrate GS; a placement base 46 disposed in the processing chamber 41 and on which the glass substrate GS is placed; a lift pin 48 which moves up and down the glass substrate GS on the placement base 46, the lift pin 48 including a flat support surface 49, which is arranged parallel to a plate surface of the glass substrate GS and supports the plate surface from the lower side, and a curved surface 50 which is formed at a periphery of the lift pin 48 and has a rounded cross section shape. |
