发明名称 METHOD OF FABRICATING SINGLE-LAYER GRAPHENE
摘要 A method of fabricating a single-layer graphene on a silicon carbide (SiC) wafer includes forming a plurality of graphene layers on the SiC wafer such that the plurality of graphene layers are on a buffer layer of the SiC wafer, the buffer layer being formed of carbon; removing the plurality of graphene layers from the buffer layer; and converting the buffer layer to a single-layer graphene.
申请公布号 US2014014970(A1) 申请公布日期 2014.01.16
申请号 US201313937563 申请日期 2013.07.09
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 WOO YUN-SUNG;YOON SEON-MI;SHIN HYEON-JIN;LEE DONG-WOOK;CHOI JAE-YOUNG
分类号 H01L21/02;H01L29/16 主分类号 H01L21/02
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