发明名称 HIGHLY SCRATCH-RESISTANT IMPRINT MATERIAL CONTAINING URETHANE COMPOUND
摘要 <p>There is provided an imprint material forming a film having high abrasion resistance even after a pattern has been transferred thereto, specifically an imprint material forming a film having a small number of pieces of scratch when the film after a pattern has been transferred thereto is subjected to a steel wool abrasion test. An imprint material comprising: a component (A): a compound having at least one ethylene oxide unit and having at least one polymerizable group; a component (B): a polycaprolactone-modified urethane compound having a C13-25 long chain alkyl group and at least one polymerizable group; and a component (C): a photopolymerization initiator.</p>
申请公布号 KR20140005248(A) 申请公布日期 2014.01.14
申请号 KR20137021643 申请日期 2012.01.18
申请人 NISSAN CHEMICAL INDUSTRIES, LTD. 发明人 KOBAYASHI JUNPEI;SHUTO KEISUKE;KATO TAKU;SUZUKI MASAYOSHI
分类号 C08G18/67;B29C59/02;B29K75/00;C08F2/50;C08F290/06;C08F299/06;G02F1/1333;H01L21/027 主分类号 C08G18/67
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