| 摘要 |
PURPOSE: A substrate processing apparatus is provided to repetitively circulate a substrate by using a transfer unit for moving the substrate to a loading position. CONSTITUTION: A loading unit(210) receives a substrate(G) from the outside and horizontally transfers the substrate. A first vertical transfer unit(310) moves the substrate to a supply transfer unit(400). A process unit(500) processes the substrate along the supply transfer unit. A discharge transfer unit(400') moves the substrate processed by the processing unit to a second vertical transfer unit(310'). An unloading unit(210') horizontally transfers the second vertical transfer unit to an unloading position. A transfer unit(600) delivers the substrate transferred to the unloading position to the loading unit. |
