Method for performing dose control for electron beam exposure systems, involves creating set of patterns for elementary figures in electron beam exposure system, and determining dose levels based on created patterns

摘要

The method involves providing a set of exposed figures that is divided into elementary figures, where figures represent a small number of controllable dose levels. A proximity correction is provided for the set of elementary figures, and an optimally corrected exposure pattern is assigned for each of the elementary figures. A set of patterns is created for the elementary figures in an electron beam exposure system. The number of controllable dose levels is determined based on the created patterns.