| 摘要 |
An ion supply device according to the present invention comprises a gas box which supplies the ion gas stored in a gas tank to a process chamber. The gas box also includes multiple gas flow parts, a high pressure gas pipe which stores a gas ion in the gas tank, a first sensor that senses the pressure of the gas flow inside the high-pressure pipe, a high-pressure pipe that adjusts the gas pressure of the ion flow inside the high-pressure pipe, a low-pressure tube that makes the ion gas adjusted by the regulator to flow, a second sensor that senses the pressure of the gas flow of the ion of the low-pressure pipe, a flow regulator which regulates the flow rate of the ion flowing to the process chamber by the low-pressure pipe, a purge gas pipe which supplies the purged gas to the high-pressure pipe branched from of the high-pressure pipe and a residual gas pipe that discharges the residual gas in the process chamber to the chamber branched from the low-pressure pipe. |
