发明名称 SYSTEM AND METHOD OF ELECTRON BEAM LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To enhance throughput by decreasing the number of total shots in continuous moving lithography thereby shortening the total writing time. SOLUTION: Multiple writing is carried out by setting the dividing conditions of figure data for each stripe and controlling the shot irradiation time of writing in inverse proportion to the number of shots.
申请公布号 JP2001313253(A) 申请公布日期 2001.11.09
申请号 JP20010051257 申请日期 2001.02.26
申请人 HITACHI LTD 发明人 MIZUNO ICHII
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址