发明名称
摘要 A semiconductor device includes a MOS transistor, a source electrode and a drain electrode on the MOS transistor each include a first carbon doped silicon layer including carbon at a first carbon concentration and phosphorus at a first phosphorus concentration and a second carbon doped silicon layer over the first silicon carbide layer, which includes phosphorus at a second phosphorus concentration higher than the first phosphorus concentration, and which includes carbon at a second carbon concentration less than or equal to the first carbon concentration.
申请公布号 JP5381382(B2) 申请公布日期 2014.01.08
申请号 JP20090146657 申请日期 2009.06.19
申请人 发明人
分类号 H01L21/336;H01L21/8238;H01L27/092;H01L29/78;H01L29/786 主分类号 H01L21/336
代理机构 代理人
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