发明名称 MARKING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a marking apparatus where the distance between a wafer surface and a core or a pot tip can be adjusted so as to be constant for each adjustment of the apparatus. SOLUTION: In a marker 2, when ink in the inkpot is jetted, the core 11 projects outside the pot tip 12. By bringing the projecting core into contact with the surface of a semiconductor wafer 8, the position at which the core starts contact is electrically measured by a measuring apparatus 9, and thus the contact starting position of the core can be obtained. Further, by vertically moving the wafer surface or a marker installation position by a fixed quantity from the position, the distance between the core and the wafer surface can be adjusted so as to be constant.
申请公布号 JP2002261134(A) 申请公布日期 2002.09.13
申请号 JP20010057276 申请日期 2001.03.01
申请人 SEIKO INSTRUMENTS INC 发明人 ISHII SEIICHI
分类号 G01R31/26;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01R31/26
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