METHOD FOR MANUFACTURING THIN FILM LAMINATED ELEMENT

摘要

The purpose of the present invention is to provide a method for manufacturing a thin film laminated element, wherein alignment marks having less damage can be used for the purpose of aligning a photomask at the time of performing etching. This method for manufacturing a thin film laminated element is provided with: a second process wherein an element section (10) and alignment marks are formed on a thin film laminated body (7) by means of etching using photolithography; and a third process having a step for applying a photosensitive resist onto the thin film laminated body (7), a step for disposing on the photosensitive resist a photomask, which has alignment patterns, by aligning the photomask with the alignment patterns and the alignment marks formed in the previous process, a step for exposing and developing the photosensitive resist, and a step for forming the element section and the alignment marks on the thin film laminated body by etching the thin film laminated body having the photosensitive resist applied thereto.