喷印半导体及其制造方法,申请号TW098142789-传众专利搜索

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发明名称	喷印半导体及其制造方法
摘要
申请公布号	TWI421946	申请公布日期	2014.01.01
申请号	TW098142789	申请日期	2009.12.14
申请人	财团法人工业技术研究院新竹县竹东镇中兴路4段195号	发明人	杨宗桦;彭玉容;王怡凯;胡堂祥
分类号	H01L21/328	主分类号	H01L21/328
代理机构		代理人	祁明辉台北市信义区忠孝东路5段510号22楼之2;林素华台北市信义区忠孝东路5段510号22楼之2
主权项
地址	新竹县竹东镇中兴路4段195号

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