发明名称 |
Organic deposition apparatus and method of depositing organic substance using the same |
摘要 |
An organic material deposition system and method are provided. The organic material deposition apparatus may include a chamber having a processing space formed therein, a source supply device that generates an organic source and injects and diffuses the organic source into the processing space through a shower head provided in the processing space. The substrate is supported by a stage device that moves the substrate upward and downward within the processing space to adjust a distance between the substrate and the shower head. A pumping port provided at an upper positioned at an upper portion of the processing space provides a vacuum exhaust path that directs flow through the processing space toward the stage device. This allows an organic thin film with a uniform thickness to be deposited using an apparatus with a relatively simple configuration. |
申请公布号 |
US8617314(B2) |
申请公布日期 |
2013.12.31 |
申请号 |
US20080255160 |
申请日期 |
2008.10.21 |
申请人 |
AN YOUNG UNG;JUNG KI TAEK;JI JONG YEOUL;KIM SANG LEOUL;ADP ENGINEERING CO., LTD. |
发明人 |
AN YOUNG UNG;JUNG KI TAEK;JI JONG YEOUL;KIM SANG LEOUL |
分类号 |
C23C16/00 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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