发明名称 METHOD OF ATOMIC ABSORPTION ANALYSIS AND ATOMIC ABSORPTION PHOTOMETER
摘要 <p>Provided is an atomic absorption photometer with which a liquid measurement sample injected into a graphite tube is dried in a pre-measurement stage, wherein it is possible to determine whether the drying has been properly executed, and wherein a targeted measurement sensitivity and measurement reproducibility are provided with a minimum number of measurements and without many repetitions of measurement. The present invention comprises finding the absorbance of reference light, which is a component perpendicular to a magnetic field in light transmitted through a heating section, and determining there to be bumping of a sample if the duration of time where the absorbance of the reference light is greater than a predetermined value is within a predetermined duration of time; or alternatively finding the absorbance of sample light, which is a component parallel to a magnetic field in light transmitted through the heating section, and the absorbance of reference light, which is a component perpendicular to the magnetic field in light transmitted through the heating section, and determining there to be bumping of a sample if a corrected absorbance obtained by subtracting the reference light absorbance from the sample light absorbance is greater than a predetermined value.</p>
申请公布号 WO2013190980(A1) 申请公布日期 2013.12.27
申请号 WO2013JP65308 申请日期 2013.06.03
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 TOBE HAYATO;ISHIDA HIROYASU;SAKAMOTO HIDEYUKI
分类号 G01N21/31 主分类号 G01N21/31
代理机构 代理人
主权项
地址