| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method by which a trench pattern or a hole pattern having an ultrafine width or hole diameter can be formed while generation of blob defects is sufficiently reduced, and to provide a composition used for the method, a method for manufacturing an electronic device, and an electronic device.SOLUTION: A pattern forming method includes: a step of forming a first film by using an actinic ray-sensitive or radiation-sensitive resin composition (I), which contains a resin (A) showing an increase in the polarity by an action of an acid to decrease the solubility with a developing solution containing an organic solvent, and a compound (B) generating an acid by irradiation with actinic rays or radiation, and exposing and developing the first film to form a negative pattern; and a step of forming a second film on the negative pattern by using a composition (II), which contains a compound (A') showing an increase in the polarity by an action of an acid to decrease the solubility with a removing solution containing an organic solvent, and removing a region where an acid generating from the compound (B) does not react with the compound (A'), by using a removing solution. |
