发明名称 |
Optical system and method for inspection of patterned samples |
摘要 |
An optical inspection system for inspecting a patterned sample located in an inspection plane includes an illumination unit defining an illumination path, and a light collection unit defining a collection path, each path having a certain angular orientation with respect to the inspection plane. The illumination unit comprises an illumination mask located in a first spectral plane with respect to the inspection plane and the light collection unit comprises a collection mask located in a second spectral plane with respect to the inspection plane being conjugate to the first spectral plane. Arrangements of features of the first and second patterns are selected in accordance with a diffraction response from said patterned sample along a collection channel defined by the angular orientation of the illumination and collection paths. |
申请公布号 |
US8614790(B2) |
申请公布日期 |
2013.12.24 |
申请号 |
US201113323591 |
申请日期 |
2011.12.12 |
申请人 |
BERLATZKY YOAV;KOFLER IDO;MESHULACH DORON;BARKAN KOBI;APPLIED MATERIALS ISRAEL, LTD. |
发明人 |
BERLATZKY YOAV;KOFLER IDO;MESHULACH DORON;BARKAN KOBI |
分类号 |
G01J3/02 |
主分类号 |
G01J3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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