发明名称 |
APPARATUS FOR TREATING A SUBSTRATE |
摘要 |
The present invention relates to a substrate processing apparatus. The substrate processing apparatus according to the present invention includes a plasma boundary limit unit. The plasma boundary limit unit is combined with a door assembly which opens or closes an opening part which a substrate is inputted to or outputted from and vertically moves with the door assembly. |
申请公布号 |
KR20130138474(A) |
申请公布日期 |
2013.12.19 |
申请号 |
KR20120062081 |
申请日期 |
2012.06.11 |
申请人 |
SEMES CO., LTD. |
发明人 |
KOO, IL GYO;SHIM HYUN JONG |
分类号 |
H01L21/205;H01L21/3065 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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