发明名称 RADIATION-SENSITIVE COMPOSITION, COLOR FILTER, AND METHOD OF MANUFACTURING COLOR FILTER
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition with little residue, excellent dimensional stability, and little change in the line width after a post exposure time delay.SOLUTION: The radiation-sensitive composition contains polymers, polymerizable compounds, and polymerization initiators. The polymers include a polymer obtained by polymerizing monomer components including a compound represented by a specified general formula (ED). The polymerizable compounds include a (meth)acrylate compound which has an acid group and two or more functional groups. (In the general formula (ED), Rand Reach represent a hydrogen atom or a C1-C25 hydrocarbon group which may have a substituent.)
申请公布号 JP2013254047(A) 申请公布日期 2013.12.19
申请号 JP20120128591 申请日期 2012.06.06
申请人 FUJIFILM CORP 发明人 KARAHANA TOSHIHITO;TAGUCHI YASUSHI;TAKAKUWA HIDEKI
分类号 G03F7/038;C08F2/00;C08F2/44;C08F20/00;G02B5/20;G03F7/004;H01L51/50;H05B33/12 主分类号 G03F7/038
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