发明名称 |
RADIATION-SENSITIVE COMPOSITION, COLOR FILTER, AND METHOD OF MANUFACTURING COLOR FILTER |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition with little residue, excellent dimensional stability, and little change in the line width after a post exposure time delay.SOLUTION: The radiation-sensitive composition contains polymers, polymerizable compounds, and polymerization initiators. The polymers include a polymer obtained by polymerizing monomer components including a compound represented by a specified general formula (ED). The polymerizable compounds include a (meth)acrylate compound which has an acid group and two or more functional groups. (In the general formula (ED), Rand Reach represent a hydrogen atom or a C1-C25 hydrocarbon group which may have a substituent.) |
申请公布号 |
JP2013254047(A) |
申请公布日期 |
2013.12.19 |
申请号 |
JP20120128591 |
申请日期 |
2012.06.06 |
申请人 |
FUJIFILM CORP |
发明人 |
KARAHANA TOSHIHITO;TAGUCHI YASUSHI;TAKAKUWA HIDEKI |
分类号 |
G03F7/038;C08F2/00;C08F2/44;C08F20/00;G02B5/20;G03F7/004;H01L51/50;H05B33/12 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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