| 摘要 |
<P>PROBLEM TO BE SOLVED: To align the focus position of a light beam onto the principal plane of a substrate with high precision in each main scanning. <P>SOLUTION: A pattern drawing apparatus includes a distance detecting part 5 acquiring a detected distance to the principal plane of a substrate 9, and a focusing mechanism 471 adjusting the focus of the light beam from a head. When drawing a pattern in a linear area extending in a main scanning direction in each main scanning which represents an outward route or a return route, a plurality of detected distances are obtained with respect to the linear area where a pattern is to be drawn in the next main scanning; and the focus adjustment is performed in a plurality of times by using the plurality of detected distances obtained in the last main scanning. A control part 6 controls in such a manner that, in terms of the main scanning direction, detection positions where a plurality of detected distances are obtained in each of the outward route and the return route coincide with a plurality of positions of irradiation areas when the focus adjustment in a plurality of times is completed, and that the detection positions of the plurality of detected distances in the outward route and the return route are approximated. Thereby, the focus position of a light beam in each main scanning aligned with the principal plane with high precision. <P>COPYRIGHT: (C)2011,JPO&INPIT |
