| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photoradical polymerization initiator, a photocurable composition and a photosensitive resist. <P>SOLUTION: The photoradical polymerization initiator is represented by formula (I) (wherein A is an alicyclic hydrocarbon group, an aromatic ring-bearing group or a heterocycle-bearing group; R<SB>1</SB>is a linear or alicyclic hydrocarbon group, an aromatic ring-bearing group, a styrene polymer or a conjugated diene polymer; and R<SB>2</SB>is a hydrogen atom, a linear or alicyclic hydrocarbon group, an aromatic ring-bearing group, an anionically polymerized polymer or a living-radically polymerized polymer). <P>COPYRIGHT: (C)2009,JPO&INPIT |
