| 摘要 |
An immersion exposure apparatus and method exposes a substrate with an exposure beam via an optical element and immersion liquid. The apparatus includes a substrate stage having a table and a member. The table mounts the substrate and is configured to maintain the immersion liquid below the optical element when located opposed to the optical element. The member is configured to maintain the immersion liquid below the optical element when located opposed to the optical element. The substrate stage is configured such that, when the table is located opposed to the optical element, the table and the member are movable relative to the optical element in a state in which a surface of the table and a surface of the member are arranged adjacent to each other so that the immersion liquid below the optical element is thereby transferred from the table to the member. |
