| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning device and a method which allow for enhancement of drying efficiency of a substrate.SOLUTION: The substrate cleaning device includes a substrate support unit for supporting a substrate, a container surrounding the substrate support unit and recovering an organic solvent scattering from the substrate, and a fluid supply unit provided on one side of the container and jetting the organic solvent of liquid phase containing bubbles to the substrate. The fluid supply unit includes a nozzle head for discharging the organic solvent to the substrate, an organic solvent supply line for supplying the organic solvent from a storage tank to the nozzle head, and a bubble supply member provided in the supply line and supplying bubbles to the organic solvent. |
