| 摘要 |
PROBLEM TO BE SOLVED: To provide an inexpensive method for supplying mask blanks.SOLUTION: The present invention relates to a method for supplying simulation information about mask blanks including a multilayer mirror formed on a substrate to reflect exposure light and a light absorption layer formed on the multilayer mirror to absorb exposure light. The method comprises: a step S13 of acquiring defect information based on phase defects in mask blanks; a step S14 of performing lithograph simulation under at least one or more lithograph simulation conditions by using the defect information; and a step S15 of storing in memory the result of the lithograph simulation and the at least one or more lithograph simulation conditions along with identification information of mask blanks in order to supply the result of the lithograph simulation to customers. |
