| 摘要 |
PROBLEM TO BE SOLVED: To provide a nanoimprint method and a nanoimprint device capable of releasing a mold and a transferred resin layer more easily.SOLUTION: In a nanoimprint method, a resin layer consisting of UV-curing resin is formed on a substrate, a mold having an irregularly patterned part is applied to the resin layer so that the irregularly patterned part comes into contact with the resin layer, and then the resin layer is irradiated with UV-rays under an atmosphere containing gas which impedes curing of the UV-curing resin to cure the resin layer. |
