发明名称 |
HEAT PROCESSING APPARATUS, COOLING METHOD FOR HEAT PROCESSING PLATE, AND COMPUTER STORAGE MEDIUM |
摘要 |
<p>The present invention rapidly increases and decreases the temperature of a heat processing plate. The present invention relates to a heat processing device capable of performing heat processing by laminating a wafer (W) on the heat processing plate (50). The heat processing device comprises a second cooling plate (62), a first cooling plate (61), and a cooling plate elevating tool (60). The second cooling plate approaches and cools the heat processing plate (50). The first cooling plate cools the second cooling plate. The cooling plate elevating tool moves the second cooling plate (62) between a waiting position for cooling the first cooling plate (61) and a cooling position for cooling the heat processing plate (50). An elastic member (95) is installed between the second cooling plate (62) and the cooling plate elevating tool (60).</p> |
申请公布号 |
KR20130135110(A) |
申请公布日期 |
2013.12.10 |
申请号 |
KR20130060985 |
申请日期 |
2013.05.29 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MIZUNAGA KOUICHI;TOYOZAWA AKIHIRO;OOSHIMA KAZUHIKO |
分类号 |
H01L21/027;H01L21/02 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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