| 摘要 |
A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2),
wherein R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f s represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8. |
