发明名称 |
AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS |
摘要 |
<p>An aqueous polishing composition comprising (A) at least one water-soluble or water-dispersible compound selected from the group consisting of N-substituted diazenium dioxides and N'-hydroxy-diazenium oxide salts; and (B) at least one type of abrasive particles; the use of the compounds (A) for manufacturing electrical, mechanical and optical devices and a process for polishing substrate materials for electrical, mechanical and optical devices making use of the aqueous polishing composition.</p> |
申请公布号 |
KR20130133175(A) |
申请公布日期 |
2013.12.06 |
申请号 |
KR20137008945 |
申请日期 |
2011.09.06 |
申请人 |
BASF SE |
发明人 |
NOLLER BASTIAN;FRANZ DIANA;LI YUZHUO;USMAN IBRAHIM SHEIK ANSAR;PINDER HARVEY WAYNE;VENKATARAMAN SHYAM SUNDAR |
分类号 |
C09K3/14;A01N51/00;B24B37/00;C09G1/02;C09G1/04;H01L21/304 |
主分类号 |
C09K3/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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