| 摘要 |
<p>The present invention relates to an apparatus which allows producing elements with individually patterned anisotropic properties, where the pattern may vary from element to element. An apparatus according to the invention comprises a support for a substrate and an exposure unit for providing spatially modulated aligning light with a first polarization plane, wherein the exposure unit contains a light source, a spatial light modulator, which can be controlled electronically, for example by a computer, and a projection lens. The present invention furthermore relates to a method for fast production of elements with individually patterned anisotropic properties using such an apparatus.</p> |
