发明名称 FILM-FORMATION DEVICE AND FILM-FORMATION METHOD
摘要 PROBLEM TO BE SOLVED: To be able to improve application efficiency.SOLUTION: A film-formation device includes an aerosol generation unit, a chamber, a nozzle, and a moving mechanism. The aerosol generation unit generates an aerosol in which a solution of a film formation material is dispersed in a carrier gas. The aerosol generated by the aerosol generation unit is supplied from a base end unit to the chamber in which the supplied aerosol is vaporized to produce fine particles of the film formation material. The nozzle discharges the microparticles released from the end of the chamber toward a substrate. The moving mechanism moves the nozzle and the substrate relatively along the surface of the substrate. The nozzle has a microparticle discharge opening at a slit-shaped region extending in a direction perpendicular to the direction of motion by the moving mechanism.
申请公布号 JP2013237024(A) 申请公布日期 2013.11.28
申请号 JP20120112653 申请日期 2012.05.16
申请人 TOKYO ELECTRON LTD 发明人 WADA NORIO
分类号 B05B7/04 主分类号 B05B7/04
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