发明名称 HARGED PARTICLE BEAM DEVICE, METHOD FOR REGULATING ASTIGMATISM AND METHOD OF MANUFACTURING DEVICE USING THE SAME
摘要 The present invention rapidly adjusts astigmatism by using a simple algorithm with the auto-focus evaluation value of an image which is obtained from the pattern formed on a sample. The present invention detects second charged particles such as electrons, reflective electrons, backscattered electrons, etc. by radiating a charged particle beam to the sample (W). A charged particle beam device (300) which observes and evaluates the sample (W) comprises an astigmatism adjustment unit (17) which adjusts the astigmatism of the charged particle beam. The charged particle beam device applies an adjustment voltage having a maximal focus evaluation value, which is obtained from the image, to the astigmatism adjustment unit (17). The charged particle beam device (17) is multipole comprising a plurality of pairs of electrodes or coils which is faced to each other in the center of the optical axis of the charged particle beam. Disclosed is a charged particle beam device (400) capable of observing and evaluating the surface of the sample without a charge-up phenomenon.
申请公布号 KR20130129344(A) 申请公布日期 2013.11.28
申请号 KR20130136867 申请日期 2013.11.12
申请人 EBARA CORPORATION 发明人 WATANABE KENJI;MURAKAMI TAKESHI;TAJIMA RYO;HATAKEYAMA MASAHIRO;TSUNEOKA MASATOSHI;NOJI NOBUHARU
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
主权项
地址