发明名称 Liquid precursor for depositing group 4 metal containing films
摘要 The present invention is related to a family of liquid group 4 precursors represented by the formula: (pyr*)M(OR1)(OR2)(OR3) wherein pyr* is an alkyl substituted pyrrolyl, wherein M is group 4 metals include Ti, Zr, and Hf; wherein R1-3 can be same or different and selected from group consisting of linear or branched C1-6 alkyls; preferably C1-3 alkyls; R4 is selected from the group consisting of C1-6 alkyls, preferably branched C3-5 alkyls substituted at 2, 5 positions to prevent the pyrrolyl coordinated to the metal center in eta1 fashion; n=2, 3, 4. Most preferably the invention is directed to (2,5-di-tert-butylpyrrolyl)(tris(ethoxy)titanium, (2,5-di-tert-amylpyrrolyl)(tris(ethoxy)titanium, and (2,5-di-tert-amylpyrrolyl)(tris(iso-propoxy)titanium. The invention is also directed to (cyclopentadienyl)(2,5-di-methylpyrrolyl)(bis(ethoxy))titanium. Deposition methods using these compounds are also contemplated.
申请公布号 US8592606(B2) 申请公布日期 2013.11.26
申请号 US20100950352 申请日期 2010.11.19
申请人 LEI XINJIAN;NORMAN JOHN ANTHONY THOMAS;SPENCE DANIEL P.;AIR PRODUCTS AND CHEMICALS, INC. 发明人 LEI XINJIAN;NORMAN JOHN ANTHONY THOMAS;SPENCE DANIEL P.
分类号 C07F7/00;C07F7/28;C23C16/00 主分类号 C07F7/00
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